A technical paper titled “Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly” was published by researchers at Tokyo Institute of Technology and Tokyo ...
A recently developed block copolymer could help push the limits of integration and miniaturization in semiconductor manufacturing, report scientists in Tokyo Tech and TOK. Chemically tailored for ...
As technology continues to advance, scientists and engineers are constantly searching for more efficient and effective ways to create new materials and devices. One increasingly popular method is self ...
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