Semiconductor Engineering

Litho Challenges Break The Design-Process Wall

Multipatterning challenges are forcing design teams to work much more closely with manufacturing—and to absorb some of the costs. The days when chip designers could throw tape “over the wall” to the ...
Business Wire

DNP Develops Photomask Process for 3nm EUV Lithography

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...
al.com

Space One Eleven features demonstration of the process of lithography at "Multiple Methods: A Print Exhibition" opening (Scribblers photos)

From traditional printmaking to digitally-derived art, the works featured in "Multiple Methods: A Print Exhibition" show a diverse and dynamic perspective of the print process. The exhibition at Space ...
The New York Times

NEW PRINTING PROCESS; Device to Use Smooth Plate on Rotary Press. Principle of Lithography Said to be Successfully Applied -- Speed and Economy.

TimesMachine is an exclusive benefit for home delivery and digital subscribers. About the Archive This is a digitized version of an article from The Times’s print archive, before the start of online ...
Business Wire

DNP Accelerates Development of Photomask Manufacturing Process for 2nm Generation EUV Lithography

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has begun development of a photomask manufacturing for 2-nanometer (10-9 meter) generation logic semiconductors that support ...